SP 2000 Magnetron Sputter Deposition System

Flexible Single or Multiple Layer Coating Systems

The Model SP 2000 Magnetron Sputter Deposition System is an affordable, highly flexible, multi-functional, and reconfigurable sputtering tool that can be used for single or multiple layer thin film coatings. 

This system is ideal for research / development and small batch pilot production.  Upgradeable process software modules allow fully automatic operation with loading and unloading of the substrates the only operator intervention required.  A 10” viewport door allows easy access for loading and unloading without opening the top cover, or loading can be carried out with an optional loadlock. 

Process-Specific Features
A very wide variety of process enhancement features are available for the SP 2000 such as a rotating wafer chuck.  A typical chuck handles 2” to 6” wafers with variable rotation from 0 to 30 RPM.  For multi-layer films, three or four magnetron cathodes can be supplied, depending upon the desired cathode sizes.  Many more options and arrangements can be supplied. 

Additional features and benefits:
• Confocal or parallel cathode configurations
• RF, DC, or pulsed DC cathode power supplies
• Powerful PC/PLC based control system for intuitive operation

• More details are listed in the SP 2000 brochure

Please click here for the SP 2000 Brochure.